Layout Acceleration Technology From IC Mask Design/Tanner Shortlisted for European Electronics Industry Award

Limerick, IRELAND, 1 November 2010: HiPerDevGen, the Analog Layout Acceleration software tool from IC Mask Design / Tanner EDA has been shortlisted for a prestigious European Electronics Industry Award.

HiPerDevGen provides a dramatic acceleration of the analog layout design process through the automatic recognition and generation of common analog structures. The software understands the functional requirements of designs, and with an understanding and implementation of more than 20 process artefacts, generates high quality and consistent output.

Speaking on the shortlist nomination, Fergal Brosnan, CEO of IC Mask Design said, “To be shortlisted for this award alongside the major players in the EDA industry is a significant achievement for a company like IC Mask Design, and highlights the industry recognition we have received for our technology”.

The Elektra awards ceremony will be held on 9 December in London. There are 16 separate awards categories. Chosen by an independent panel of judges, IC Mask Design is a finalist in the “Design Tools and Software Development” category. Also shortlisted are Cadence Design Systems, Lattice Semiconductor, Mentor Graphics, MontaVista Software and Synopsys.

About Elektra: www.elektraawards.co.uk

The Elektra Awards gives the electronics industry the opportunity to recognise the achievements of individuals and companies across Europe. They are designed to promote best practice in key areas including innovation, sales growth and employee motivation.

About Tanner: www.tannereda.com

Tanner EDA provides a complete line of software solutions that catalyze innovation for the design, layout and verification of analog and mixed-signal (A/MS) integrated circuits (ICs). Customers are creating breakthrough applications in areas such as power management, displays and imaging, automotive, consumer electronics, life sciences, and RF devices. A low learning curve, high interoperability, and a powerful user interface improve design team productivity and enable a low total cost of ownership (TCO). Capability and performance are matched by low support requirements and high support capability as well as an ecosystem of partners that bring advanced capabilities to A/MS designs.

Founded in 1988, Tanner EDA solutions deliver the right mixture of features, functionality and usability. The company has shipped over 33,000 licenses of its software to more than 5,000 customers in 67 countries.

About IC Mask Design

IC Mask Design is an industry leader in the provision of Physical Design Services and Software Solutions to the semiconductor industry. The company’s services encompass IC Layout and Training Programs, delivering expertise in Analog, RF, mixed-signal and digital design using the latest tools from leading EDA vendors. IC Mask Design also provides training courses covering the complete spectrum of physical design. Its Analog Layout Acceleration Platform aims to dramatically reduce analog layout design cycle time whilst producing optimal quality layout structures which incorporate circuit functionality requirements and process artefacts.