IC Mask Design to Present at the Design Automation Conference in Anaheim California
Limerick, Ireland – 1 June 2010: IC Mask Design Founder and Chief Technical Officer, Ciaran Whyte, is to present his views on “High Performance Device and Structure Generation for A/MS Design” at the Design Automation Conference to be held in Anaheim California in June 2010 (www.dac.com).
Attempts to automate the analog layout process have, until now, met with limited success. Forgoing full automation, IC Mask Design has focused on acceleration of the process in the creation of HiPerDevGen. Mr. Whyte will demonstrate that without any change to design flow methodology, and using only manufacturing design rules as input, high quality design primitives are generated and matched to address common processing artefacts. Results are equal to hand design and cycle time is dramatically reduced. Users retain control for tuning the design to address specific matching, parasitic and performance requirements.
IC Mask Design has recently launched HiPerDevGen, an innovative Analog Layout Acceleration Platform, in partnership with Tanner EDA. HiPerDevGen is now available as part of the Tanner suite of EDA tools.
DAC is the world’s leading technical conference and tradeshow, covering the latest trends in electronic design and design automation. DAC is where the IC Design and EDA ecosystem learns, networks, and does business — where critical industry issues are faced and solutions presented. www.dac.com
About Tanner EDA
Tanner EDA provides a complete line of software solutions that catalyze innovation for the design, layout and verification of analog and mixed-signal (A/MS) integrated circuits (ICs). Customers are creating breakthrough applications in areas such as power management, displays and imaging, automotive, consumer electronics, life sciences, and RF devices. A low learning curve, high interoperability, and a powerful user interface improve design team productivity and enable a low total cost of ownership (TCO). Capability and performance are matched by low support requirements and high support capability as well as an ecosystem of partners that bring advanced capabilities to A/MS designs. Founded in 1988, Tanner EDA solutions deliver the right mixture of features, functionality and usability. The company has shipped over 33,000 licenses of its software to more than 5,000 customers in 67 countries. www.tannereda.com
About IC Mask Design
IC Mask Design is an industry leader in the provision of Physical Design Services and Software Solutions to the semiconductor industry. The company’s services encompass IC Layout and Training Programs, delivering expertise in Analog, RF, mixed-signal and digital design using the latest tools from leading EDA vendors. IC Mask Design also provides training courses covering the complete spectrum of physical design. Its Analog Layout Acceleration Platform aims to dramatically reduce analog layout design cycle time whilst producing optimal quality layout structures which incorporate circuit functionality requirements and process artefacts.