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March 2005

IC Mask Design Exhibits At DATE Conference

IC Mask Design, a provider of complete integrated circuit layout solutions to the semiconductor design industry, will be exhibiting at the Design Automation and Test in Europe Conference, taking place at the ICM, Messe, in Munich Germany, on the 8th through to the 11th October 2005.

DATE is Europe’s largest forum for the design engineering community involved in the design, automation and test of Systems-on-Chip, Embedded Systems, IP, ASIC, FPGA and PCB.




About IC Mask Design

IC Mask Design is an industry leader in the provision of Physical Design Services and Software Solutions to the semiconductor industry. The company’s services encompass IC Layout and Training Programs, delivering expertise in Analog, RF, mixed-signal and digital design using the latest tools from leading EDA vendors. IC Mask Design also provides training courses covering the complete spectrum of physical design. Its Analog Layout Acceleration Platform aims to dramatically reduce analog layout design cycle time whilst producing optimal quality layout structures which incorporate circuit functionality requirements and process artefacts.

Further information is available from IC Mask Design's web site.

For more details, please contact:

Fergal Brosnan
Tel: +353 (0)61 448 530
Email: