IC Mask Design News
April 2004
IC Mask Design Launches Its IC Layout Training Division, Master-IC™
LIMERICK, IRELAND
IC Mask Design, a leading design services company to the global semiconductor industry, has today launched Master-IC™, its Physical Design training division. Master-IC™ incorporates a suite of leading edge training programs covering the complete spectrum of IC Layout.
IC Mask Design will operate its training courses from a state-of-the-art facility at their Corporate Headquarters in Limerick, Ireland. The company also plans on running courses in key geographical locations worldwide, along with the option for on-site customer training. The programs' modular design allows them to be easily adapted to customers' specific requirements. All courses are independent of any particular EDA environment.
Having already successfully delivered a range of training programs to leading semiconductor organisations, the new division will enable global expansion of the training offering.
Speaking on the launch of Master-IC™, Mr. Fergal Brosnan, CEO of IC Mask Design said, "We are delighted to announce the launch of Master-IC™, which will provide a complete physical design training solution for our worldwide customers' specific requirements."
About Master-IC™ Training
Master-IC™ Training – the training division of IC Mask Design – was launched in early 2004, and has since carved out a position as a dominant global player in the area of IC Layout training.
Further information is available from the Master-IC™ Training website.
About IC Mask Design
IC Mask Design is an industry leader in the provision of Physical Design Services and Software Solutions to the semiconductor industry. The company’s services encompass IC Layout and Training Programs, delivering expertise in Analog, RF, mixed-signal and digital design using the latest tools from leading EDA vendors. IC Mask Design also provides training courses covering the complete spectrum of physical design. Its Analog Layout Acceleration Platform aims to dramatically reduce analog layout design cycle time whilst producing optimal quality layout structures which incorporate circuit functionality requirements and process artefacts.
Further information is available from IC Mask Design's web site.
For more details, please contact:
Fergal BrosnanTel: +353 (0)61 448 530
Email: